OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 9 — Mar. 20, 2010
  • pp: 1574–1580

High-spatial-resolution nulling microellipsometer using rotational polarization symmetry

Alain Tschimwang and Qiwen Zhan  »View Author Affiliations

Applied Optics, Vol. 49, Issue 9, pp. 1574-1580 (2010)

View Full Text Article

Enhanced HTML    Acrobat PDF (843 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



We report the design and experimental testing of a high-spatial-resolution nulling microellipsometer. This microellipsometer design is based on the previously reported principle of rotational polarization symmetry to improve the signal-to-noise ratio of spatially resolved ellipsometric measurements. Through the use of an electro-optic polarization rotator, a null detection scheme is made possible and implemented. Surface profiling of a lithographically patterned microstructure is demonstrated with the nulling microellipsometer. A lateral spatial resolution of 0.48 μm is calculated with a numerical aperture of 0.9 and an illumination wavelength of 632.8 nm .

© 2010 Optical Society of America

OCIS Codes
(070.6110) Fourier optics and signal processing : Spatial filtering
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(260.1440) Physical optics : Birefringence
(260.5430) Physical optics : Polarization

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: December 2, 2009
Manuscript Accepted: February 19, 2010
Published: March 11, 2010

Alain Tschimwang and Qiwen Zhan, "High-spatial-resolution nulling microellipsometer using rotational polarization symmetry," Appl. Opt. 49, 1574-1580 (2010)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. D. Pristinski, V. Kozlovskaya, and S. A. Sukhishvili, “Determination of film thickness and refractive index in one measurement of phase-modulated ellipsometry,” J. Opt. Soc. Am. A 23, 2639-2644 (2006). [CrossRef]
  2. A. Mendoza-Galván, K. Järrendahl, H. Arwin, Y. Huang, L. Chen, and K. Chen, “Spectroscopic ellipsometry analysis of silicon nanotips obtained by electron cyclotron resonance plasma etching,” Appl. Opt. 48, 4996-5004 (2009). [CrossRef] [PubMed]
  3. G. Georges, L. Arnaud, L. Siozade, N. Le Neindre, F. Chazallet, M. Zerrad, C. Deumié, and C. Amra, “From angle-resolved ellipsometry of light scattering to imaging in random media,” Appl. Opt. 47, C257-C265 (2008). [CrossRef] [PubMed]
  4. Y. A. Zaghloul and A. R. M. Zaghloul, “Single-angle-of-incidence ellipsometry,” Appl. Opt. 47, 4579-4588 (2008). [CrossRef] [PubMed]
  5. T. E. Jenkins, “Multiple-angle-of-incidence ellipsometry,” J. Phys. D 32, R45-R56 (1999). [CrossRef]
  6. G. G. Tompkins, A User's Guide to Ellipsometry (Academic, 1993).
  7. J. Humlicek, “Polarized light and ellipsometry,” in Handbook of Ellipsometry, T. Harland and E. A. Irene, eds. (Springer, 2005), pp. 3-90.
  8. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1977).
  9. F. Linke and R. Merkle, “Quantitative ellipsometry microscopy at the silicon-air interface,” Rev. Sci. Instrum. 76, 063701 (2005). [CrossRef]
  10. S. Otsuki and M. Ishikawa, “Polarization modulation imaging ellipsometer,” Opt. Lett. 32, 130-132 (2007). [CrossRef]
  11. S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.
  12. M. Erman and J. B. Theeten, “Spatially resolved ellipsometry,” J. Appl. Phys. 60, 859-873 (1986). [CrossRef]
  13. A. Liu, P. C. Wagner Jr., and J. L. Plawsky, “Image scanning ellipsometry for measuring nonuniform film thickness profiles,” Appl. Opt. 33, 1223-1229 (1994). [CrossRef] [PubMed]
  14. J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998). [CrossRef]
  15. C. W. See, M. G. Somekh, and R. D. Holmes, “Scanning optical microellipsometry for pure surface profiling,” Appl. Opt. 35, 6663-6668 (1996). [CrossRef] [PubMed]
  16. Q. Zhan and J. R. Leger, “Microellipsometer with radial symmetry,” Appl. Opt. 41, 4630-4637 (2002). [CrossRef] [PubMed]
  17. Q. Zhan and J. R. Leger, “Interferometric measurement of Berry's phase in space-variant polarization manipulations,” Opt. Commun. 213, 241-245 (2002). [CrossRef]
  18. W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited