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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 9 — Mar. 20, 2010
  • pp: 1574–1580

High-spatial-resolution nulling microellipsometer using rotational polarization symmetry

Alain Tschimwang and Qiwen Zhan  »View Author Affiliations


Applied Optics, Vol. 49, Issue 9, pp. 1574-1580 (2010)
http://dx.doi.org/10.1364/AO.49.001574


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Abstract

We report the design and experimental testing of a high-spatial-resolution nulling microellipsometer. This microellipsometer design is based on the previously reported principle of rotational polarization symmetry to improve the signal-to-noise ratio of spatially resolved ellipsometric measurements. Through the use of an electro-optic polarization rotator, a null detection scheme is made possible and implemented. Surface profiling of a lithographically patterned microstructure is demonstrated with the nulling microellipsometer. A lateral spatial resolution of 0.48 μm is calculated with a numerical aperture of 0.9 and an illumination wavelength of 632.8 nm.

© 2010 Optical Society of America

OCIS Codes
(070.6110) Fourier optics and signal processing : Spatial filtering
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(260.1440) Physical optics : Birefringence
(260.5430) Physical optics : Polarization

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: December 2, 2009
Manuscript Accepted: February 19, 2010
Published: March 11, 2010

Citation
Alain Tschimwang and Qiwen Zhan, "High-spatial-resolution nulling microellipsometer using rotational polarization symmetry," Appl. Opt. 49, 1574-1580 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-9-1574

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