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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 49, Iss. 9 — Mar. 20, 2010
  • pp: 1581–1585

Characterization of optical constants for uranium from 10 to 47 nm

Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, and Justin Peatross  »View Author Affiliations


Applied Optics, Vol. 49, Issue 9, pp. 1581-1585 (2010)
http://dx.doi.org/10.1364/AO.49.001581


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Abstract

We use a laser high-harmonics-based extreme-ultraviolet (EUV) polarimeter to determine the optical constants of elemental uranium in the wavelength range from 10 to 47 nm. The constants are extracted from the measured ratio of p-polarized to s-polarized reflectance from a thin uranium film deposited in situ. The film thickness is inferred from a spectroscopic ellipsometry measurement of the sample after complete oxidation in room air. Uranium has been used as a high-reflectance material in the EUV. However, difficulties with oxidation prevented its careful characterization previous to this study. We find that measured optical constants for uranium vary significantly from previous estimates.

© 2010 Optical Society of America

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(160.3900) Materials : Metals
(160.4760) Materials : Optical properties
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Materials

History
Original Manuscript: January 4, 2010
Manuscript Accepted: February 5, 2010
Published: March 11, 2010

Citation
Nicole Brimhall, Nicholas Herrick, David D. Allred, R. Steven Turley, Michael Ware, and Justin Peatross, "Characterization of optical constants for uranium from 10 to 47 nm," Appl. Opt. 49, 1581-1585 (2010)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-49-9-1581


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