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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 10 — Apr. 1, 2011
  • pp: 1453–1464

General approach to reliable characterization of thin metal films

Tatiana V. Amotchkina, Vesna Janicki, Jordi Sancho-Parramon, Alexander V. Tikhonravov, Michael K. Trubetskov, and Hrvoje Zorc  »View Author Affiliations

Applied Optics, Vol. 50, Issue 10, pp. 1453-1464 (2011)

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Optical constants of thin metal films are strongly dependent on deposition conditions, growth mode, and thickness. We propose a universal characterization approach that allows reliable determination of thin metal film optical constants as functions of wavelength and thickness. We apply this approach to determination of refractive index dispersion of silver island films embedded between silica layers.

© 2011 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

Original Manuscript: November 9, 2010
Revised Manuscript: December 21, 2010
Manuscript Accepted: December 27, 2010
Published: March 30, 2011

Tatiana V. Amotchkina, Vesna Janicki, Jordi Sancho-Parramon, Alexander V. Tikhonravov, Michael K. Trubetskov, and Hrvoje Zorc, "General approach to reliable characterization of thin metal films," Appl. Opt. 50, 1453-1464 (2011)

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