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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 11 — Apr. 10, 2011
  • pp: 1517–1522

Efficiency-enhanced photon sieve using Gaussian/overlapping distribution of pinholes

A. Sabatyan and S. Mirzaie  »View Author Affiliations

Applied Optics, Vol. 50, Issue 11, pp. 1517-1522 (2011)

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A class of photon sieve is introduced whose structure is based on the overlapping pinholes in the innermost zones. This kind of distribution is produced by, for example, a particular form of Gaussian function. The focusing property of the proposed model was examined theoretically and experimentally. It is shown that under He-Ne laser and white light illumination, the focal spot size of this novel structure has considerably smaller FWHM than a photon sieve with randomly distributed pinholes and a Fresnel zone plate. In addition, secondary maxima have been suppressed effectively.

© 2011 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1940) Diffraction and gratings : Diffraction
(110.7440) Imaging systems : X-ray imaging
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:
Diffraction and Gratings

Original Manuscript: January 7, 2011
Revised Manuscript: February 1, 2011
Manuscript Accepted: February 12, 2011
Published: April 1, 2011

A. Sabatyan and S. Mirzaie, "Efficiency-enhanced photon sieve using Gaussian/overlapping distribution of pinholes," Appl. Opt. 50, 1517-1522 (2011)

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