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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 12 — Apr. 20, 2011
  • pp: 1745–1752

Diffraction-based modeling of high-numerical-aperture in-line lensless holograms

John F. Restrepo and Jorge Garcia-Sucerquia  »View Author Affiliations


Applied Optics, Vol. 50, Issue 12, pp. 1745-1752 (2011)
http://dx.doi.org/10.1364/AO.50.001745


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Abstract

Conventionally, for modeling in-line lensless holograms of systems with high numerical apertures and diverging spherical illumination, the samples are considered as an ensemble of secondary point sources. On following Huygens’s principle, the in-line hologram is the result of the amplitude superposition of the secondary spherical wavefronts with the wavefront originated in the point source. Albeit simple, this approach limits the shapes of the objects that can be modeled and the computation time rises with the complexity of the sample. In this work, we present a diffraction-based approach to model in-line lensless holograms. Samples with any shape or size can be modeled for in-line holographic systems with numerical apertures up to 0.57. The method is successfully applied to model objects of intricate submicrometer structures and/or multiple samples lying within a unique sample volume.

© 2011 OpticalSociety of America

OCIS Codes
(090.1760) Holography : Computer holography
(110.0180) Imaging systems : Microscopy
(180.6900) Microscopy : Three-dimensional microscopy
(260.1960) Physical optics : Diffraction theory
(090.1995) Holography : Digital holography

ToC Category:
Holography

History
Original Manuscript: October 22, 2010
Revised Manuscript: January 13, 2011
Manuscript Accepted: January 14, 2011
Published: April 14, 2011

Citation
John F. Restrepo and Jorge Garcia-Sucerquia, "Diffraction-based modeling of high-numerical-aperture in-line lensless holograms," Appl. Opt. 50, 1745-1752 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-12-1745

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