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Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering |
Applied Optics, Vol. 50, Issue 13, pp. 1945-1950 (2011)
http://dx.doi.org/10.1364/AO.50.001945
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Abstract
Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of
© 2011 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
(310.4925) Thin films : Other properties (stress, chemical, etc.)
ToC Category:
Thin Films
History
Original Manuscript: January 19, 2011
Revised Manuscript: February 25, 2011
Manuscript Accepted: February 25, 2011
Published: April 28, 2011
Citation
Chien-Jen Tang, Cheng-Chung Jaing, Kun-Hsien Lee, and Cheng-Chung Lee, "Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering," Appl. Opt. 50, 1945-1950 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-13-1945
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