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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 13 — May. 1, 2011
  • pp: 1945–1950

Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering

Chien-Jen Tang, Cheng-Chung Jaing, Kun-Hsien Lee, and Cheng-Chung Lee  »View Author Affiliations

Applied Optics, Vol. 50, Issue 13, pp. 1945-1950 (2011)

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Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.

© 2011 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
(310.4925) Thin films : Other properties (stress, chemical, etc.)

ToC Category:
Thin Films

Original Manuscript: January 19, 2011
Revised Manuscript: February 25, 2011
Manuscript Accepted: February 25, 2011
Published: April 28, 2011

Chien-Jen Tang, Cheng-Chung Jaing, Kun-Hsien Lee, and Cheng-Chung Lee, "Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering," Appl. Opt. 50, 1945-1950 (2011)

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