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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 19 — Jul. 1, 2011
  • pp: 3254–3258

Design of the double-telecentric high-aperture diffractive–refractive objectives

Grigoriy I. Greisukh, Evgeniy G. Ezhov, Il’ya A. Levin, and Sergei A. Stepanov  »View Author Affiliations


Applied Optics, Vol. 50, Issue 19, pp. 3254-3258 (2011)
http://dx.doi.org/10.1364/AO.50.003254


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Abstract

The possibility for achieving optical performance of objectives, including a minimum amount of diffractive lenses, comparable to optical performance of multiple-lens conventional objectives for nanolithography, is considered. The problem of chromatism connected with using excimer lasers is solved by applying aspheric substrates that help to reduce both axial color and spherochromatic aberration.

© 2011 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(120.3620) Instrumentation, measurement, and metrology : Lens system design
(220.1000) Optical design and fabrication : Aberration compensation
(220.3620) Optical design and fabrication : Lens system design

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: January 25, 2011
Revised Manuscript: May 1, 2011
Manuscript Accepted: May 12, 2011
Published: June 28, 2011

Citation
Grigoriy I. Greisukh, Evgeniy G. Ezhov, Il’ya A. Levin, and Sergei A. Stepanov, "Design of the double-telecentric high-aperture diffractive–refractive objectives," Appl. Opt. 50, 3254-3258 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-19-3254


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References

  1. J. H. Bruning, “Optical lithography: 40 years and holding,” Proc. SPIE 6520, 652004 (2007). [CrossRef]
  2. A. B. Bel’skii, M. A. Gan, I. A. Mironov, and R. P. Seisyan, “Prospects for the development of optical systems for nanolithography,” J. Opt. Technol. 76, 496–503 (2009). [CrossRef]
  3. S. T. Bobrov, G. I. Greisukh, and Y. G. Turkevich, Optics of Diffractive Elements and Systems (in Russian) (Leningrad, 1986), Section 4, pp. 122–132.
  4. G. I. Greisukh, S. T. Bobrov, and S. A. Stepanov, Optics of Diffractive and Gradient-Index Elements and Systems (SPIE, 1997), Section 7, pp. 232–240.
  5. http://www.zemax.com.
  6. D.Basting and G.Marowsky, Excimer Laser Technology (Springer, 2005), pp. 94–97.
  7. G. I. Greisukh, E. G. Ezhov, and S. A. Stepanov, “Diffractive–refractive hybrid corrector for achro- and apochromatic corrections of optical systems,” Appl. Opt. 45, 6137–6141 (2006). [CrossRef] [PubMed]
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  9. A. G. Poleshchuk, E. G. Churin, V. P. Koronkevich, V. P. Korolkov, A. A. Kharissov, V. V. Cherkashin, V. P. Kiryanov, A. V. Kiryanov, S. A. Kokarev, and A. G. Verhoglyad, “Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure,” Appl. Opt. 38, 1295–1301 (1999). [CrossRef]
  10. V. P. Korolkov and A. G. Poleshchuk, “Fabrication and certification of high-quality and larger-aperture CGHs for optical testing,” in Frontiers in Optics, OSA Technical Digest (CD) (Optical Society of America, 2006), paper OFTuB2.

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