|
Replication of micro-optical elements with continuous relief by ultraviolet embossing with thiol-ene-based resist |
Applied Optics, Vol. 50, Issue 21, pp. 4063-4067 (2011)
http://dx.doi.org/10.1364/AO.50.004063
Enhanced HTML 
Acrobat PDF (656 KB)
Abstract
We propose in this paper to use the delayed gel point character of thiol-ene-based resist to reduce the influence of polymerization shrinkage during the replication of micro-optical elements with continuous relief by UV embossing. Experiment results indicate that this resist can be used to bring down the fabrication error to less than 2% in the vertical direction at a proper thickness of the residual resist, which is far less than that of traditional acrylate-based resist. This resist can also be used to transfer continuous relief into a fused silica substrate through reactive ion etching because of its good etching resistance.
© 2011 Optical Society of America
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(050.6875) Diffraction and gratings : Three-dimensional fabrication
ToC Category:
Diffraction and Gratings
History
Original Manuscript: April 13, 2011
Revised Manuscript: June 7, 2011
Manuscript Accepted: June 7, 2011
Published: July 15, 2011
Citation
Peng Jin, Nan Liu, Jie Lin, Jiubin Tan, and Philip D. Prewett, "Replication of micro-optical elements with continuous relief by ultraviolet embossing with thiol-ene-based resist," Appl. Opt. 50, 4063-4067 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-21-4063
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
Related Journal Articles 
- Multi-level diffractive optics for single laser exposure fabrication of telecom-band diamond-like 3-dimensional photonic crystals (OE)
- Five beam holographic lithography for simultaneous fabrication of three dimensional photonic crystal templates and line defects using phase tunable diffractive optical element (OE)
- Resist shaping for replication of micro-optical elements with continuous relief in fused silica (OL)
- Fabrication of diffractive optical elements on 3-D curved surfaces by capillary force lithography (OE)
- Lithographic fabrication of diffractive optical elements in hybrid sol-gel glass on 3-D curved surfaces (OE)
Related Conference Papers
- Laser Micromachining of ORMOCERs for High Resolution Fabrication of Optical Devices
- Guided-Mode Resonance Elements Fabricated by Microcontact Printing Method
- Technology development for DUV-DOE fabrication – Results and problems
- One-step fabrication of hybrid micro-diffractive-refractive lens with continuous relief using focused ion beam milling
- Replicated Diffractive Optical Elements in consumer products
« Previous Article | Next Article »
OSA is a member of 