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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 21 — Jul. 20, 2011
  • pp: 4063–4067

Replication of micro-optical elements with continuous relief by ultraviolet embossing with thiol-ene-based resist

Peng Jin, Nan Liu, Jie Lin, Jiubin Tan, and Philip D. Prewett  »View Author Affiliations


Applied Optics, Vol. 50, Issue 21, pp. 4063-4067 (2011)
http://dx.doi.org/10.1364/AO.50.004063


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Abstract

We propose in this paper to use the delayed gel point character of thiol-ene-based resist to reduce the influence of polymerization shrinkage during the replication of micro-optical elements with continuous relief by UV embossing. Experiment results indicate that this resist can be used to bring down the fabrication error to less than 2% in the vertical direction at a proper thickness of the residual resist, which is far less than that of traditional acrylate-based resist. This resist can also be used to transfer continuous relief into a fused silica substrate through reactive ion etching because of its good etching resistance.

© 2011 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.4000) Optical design and fabrication : Microstructure fabrication
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Diffraction and Gratings

History
Original Manuscript: April 13, 2011
Revised Manuscript: June 7, 2011
Manuscript Accepted: June 7, 2011
Published: July 15, 2011

Citation
Peng Jin, Nan Liu, Jie Lin, Jiubin Tan, and Philip D. Prewett, "Replication of micro-optical elements with continuous relief by ultraviolet embossing with thiol-ene-based resist," Appl. Opt. 50, 4063-4067 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-21-4063

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