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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 24 — Aug. 20, 2011
  • pp: 4746–4754

Spot distribution measurement using a scanning nanoslit

Anoop George and Tom D. Milster  »View Author Affiliations


Applied Optics, Vol. 50, Issue 24, pp. 4746-4754 (2011)
http://dx.doi.org/10.1364/AO.50.004746


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Abstract

A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algo rithm is determined to be very resilient. The slit is 125 nm wide and 50 μm long and is fabricated on a 120 nm thick layer of aluminum. The size of the image field is 15 μm , and simulations indicate that 200 nm Rayleigh resolution is possible with an infinitely narrow slit.

© 2011 Optical Society of America

OCIS Codes
(110.1220) Imaging systems : Apertures
(110.2960) Imaging systems : Image analysis
(310.6628) Thin films : Subwavelength structures, nanostructures
(110.6955) Imaging systems : Tomographic imaging

ToC Category:
Imaging Systems

History
Original Manuscript: January 19, 2011
Manuscript Accepted: June 2, 2011
Published: August 11, 2011

Citation
Anoop George and Tom D. Milster, "Spot distribution measurement using a scanning nanoslit," Appl. Opt. 50, 4746-4754 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-24-4746

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