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Spot distribution measurement using a scanning nanoslit

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Abstract

A scanning and rotating nanoslit is used to measure submicrometer features in focused spot distributions. Using a filtered backprojection technique, a highly accurate reconstruction is demonstrated. Experimental results are confirmed by simulating the scanning slit technique using a physical optics simulation program. Analysis of various error mechanisms is reported, and the reconstruction algo rithm is determined to be very resilient. The slit is 125nm wide and 50μm long and is fabricated on a 120nm thick layer of aluminum. The size of the image field is 15μm, and simulations indicate that 200nm Rayleigh resolution is possible with an infinitely narrow slit.

© 2011 Optical Society of America

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