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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 28 — Oct. 1, 2011
  • pp: 5559–5566

UV optical properties of thin film oxide layers deposited by different processes

Samuel F. Pellicori and Carol L. Martinez  »View Author Affiliations

Applied Optics, Vol. 50, Issue 28, pp. 5559-5566 (2011)

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UV optical properties of thin film layers of compound and mixed oxide materials deposited by different processes are presented. Japan Electron Optics Laboratory plasma ion assisted deposition (JEOL PIAD), electron beam with and without IAD, and pulsed DC magnetron sputtering were used. Comparisons are made with published deposition process data. Refractive indices and absorption values to as short as 145 nm were measured by spectroscopic ellipsometry (SE). Electronic interband defect states are detected that are deposition-process dependent. SE might be effective in identifying UV optical film quality, especially in defining processes and material composition beneficial for high-energy excimer laser applications and environments requiring stable optical properties.

© 2011 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6188) Thin films : Spectral properties

ToC Category:
Thin Films

Original Manuscript: June 16, 2011
Revised Manuscript: July 24, 2011
Manuscript Accepted: July 26, 2011
Published: September 30, 2011

Samuel F. Pellicori and Carol L. Martinez, "UV optical properties of thin film oxide layers deposited by different processes," Appl. Opt. 50, 5559-5566 (2011)

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