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UV optical properties of thin film oxide layers deposited by different processes |
Applied Optics, Vol. 50, Issue 28, pp. 5559-5566 (2011)
http://dx.doi.org/10.1364/AO.50.005559
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Abstract
UV optical properties of thin film layers of compound and mixed oxide materials deposited by different processes are presented. Japan Electron Optics Laboratory plasma ion assisted deposition (JEOL PIAD), electron beam with and without IAD, and pulsed DC magnetron sputtering were used. Comparisons are made with published deposition process data. Refractive indices and absorption values to as short as
© 2011 Optical Society of America
OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6188) Thin films : Spectral properties
ToC Category:
Thin Films
History
Original Manuscript: June 16, 2011
Revised Manuscript: July 24, 2011
Manuscript Accepted: July 26, 2011
Published: September 30, 2011
Citation
Samuel F. Pellicori and Carol L. Martinez, "UV optical properties of thin film oxide layers deposited by different processes," Appl. Opt. 50, 5559-5566 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-28-5559
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