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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 29 — Oct. 10, 2011
  • pp: 5728–5734

Diffractive light trapping in crystal-silicon films: experiment and electromagnetic modeling

Dirk N. Weiss, Benjamin G. Lee, Dustin A. Richmond, William Nemeth, Qi Wang, Douglas A. Keszler, and Howard M. Branz  »View Author Affiliations

Applied Optics, Vol. 50, Issue 29, pp. 5728-5734 (2011)

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Diffractive light trapping in 1.5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50 ° for both TE and TM polarizations.

© 2011 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Diffraction and Gratings

Original Manuscript: April 11, 2011
Revised Manuscript: August 23, 2011
Manuscript Accepted: August 25, 2011
Published: October 6, 2011

Dirk N. Weiss, Benjamin G. Lee, Dustin A. Richmond, William Nemeth, Qi Wang, Douglas A. Keszler, and Howard M. Branz, "Diffractive light trapping in crystal-silicon films: experiment and electromagnetic modeling," Appl. Opt. 50, 5728-5734 (2011)

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