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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 3 — Jan. 20, 2011
  • pp: 271–281

Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography

Yasuyuki Unno  »View Author Affiliations

Applied Optics, Vol. 50, Issue 3, pp. 271-281 (2011)

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Theoretical modeling of a slit-scan-type aerial image measurement sensor used for optical lithography is presented. Slit transmission properties are fully represented by the slit transfer function in terms of incident and scattering angles of light, which is then incorporated into the scheme of a partially coherent imaging formula to obtain an expression for image profiles measured by slit scanning. As an exemplary case, we analyze the influence of a 100 nm width slit used in an ArF lithography system. To understand the mechanism of image profile changes by slit transmission, we focus on frequency transfer characteristics of sinusoidal patterns.

© 2011 Optical Society of America

OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(110.2970) Imaging systems : Image detection systems
(110.2990) Imaging systems : Image formation theory
(110.3960) Imaging systems : Microlithography
(110.4850) Imaging systems : Optical transfer functions
(110.5220) Imaging systems : Photolithography

ToC Category:
Imaging Systems

Original Manuscript: September 13, 2010
Revised Manuscript: November 22, 2010
Manuscript Accepted: November 25, 2010
Published: January 13, 2011

Yasuyuki Unno, "Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography," Appl. Opt. 50, 271-281 (2011)

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