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Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography |
Applied Optics, Vol. 50, Issue 3, pp. 271-281 (2011)
http://dx.doi.org/10.1364/AO.50.000271
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Abstract
Theoretical modeling of a slit-scan-type aerial image measurement sensor used for optical lithography is presented. Slit transmission properties are fully represented by the slit transfer function in terms of incident and scattering angles of light, which is then incorporated into the scheme of a partially coherent imaging formula to obtain an expression for image profiles measured by slit scanning. As an exemplary case, we analyze the influence of a
© 2011 Optical Society of America
OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(110.2970) Imaging systems : Image detection systems
(110.2990) Imaging systems : Image formation theory
(110.3960) Imaging systems : Microlithography
(110.4850) Imaging systems : Optical transfer functions
(110.5220) Imaging systems : Photolithography
ToC Category:
Imaging Systems
History
Original Manuscript: September 13, 2010
Revised Manuscript: November 22, 2010
Manuscript Accepted: November 25, 2010
Published: January 13, 2011
Citation
Yasuyuki Unno, "Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography," Appl. Opt. 50, 271-281 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-3-271
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