A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.
© 2011 Optical Society of America
Optical Design and Fabrication
Original Manuscript: May 23, 2011
Manuscript Accepted: July 5, 2011
Published: October 26, 2011
Tomasz Osuch, Andrzej Kowalik, Zbigniew Jaroszewicz, and Marcin Sarzyński, "Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology," Appl. Opt. 50, 5977-5982 (2011)