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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 31 — Nov. 1, 2011
  • pp: 5977–5982

Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology

Tomasz Osuch, Andrzej Kowalik, Zbigniew Jaroszewicz, and Marcin Sarzyński  »View Author Affiliations


Applied Optics, Vol. 50, Issue 31, pp. 5977-5982 (2011)
http://dx.doi.org/10.1364/AO.50.005977


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Abstract

A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.

© 2011 Optical Society of America

OCIS Codes
(220.1230) Optical design and fabrication : Apodization
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.1950) Optical devices : Diffraction gratings

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: May 23, 2011
Manuscript Accepted: July 5, 2011
Published: October 26, 2011

Citation
Tomasz Osuch, Andrzej Kowalik, Zbigniew Jaroszewicz, and Marcin Sarzyński, "Fabrication of phase masks with variable diffraction efficiency using HEBS glass technology," Appl. Opt. 50, 5977-5982 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-31-5977

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