Abstract
A new fabrication method of apodized diffractive optical elements is proposed. It relies on using high energy beam sensitive glass as a halftone mask for variable diffraction efficiency phase masks generation in a resist layer. The presented technology is especially effective in mass production. Although fabrication of an amplitude mask is required, it is then repeatedly used in a single shot projection photolithography, which is much simpler and less laborious than the direct variable-dose pattern writing. Three prototypes of apodized phase masks were manufactured and characterized. The main advantages as well as limitations of the proposed technology are discussed.
© 2011 Optical Society of America
Full Article | PDF ArticleMore Like This
Walter Däschner, Pin Long, Robert Stein, Chuck Wu, and S. H. Lee
Appl. Opt. 36(20) 4675-4680 (1997)
Marcel Teschke and Stefan Sinzinger
Appl. Opt. 47(26) 4767-4776 (2008)
Jin Won Sung, Heidi Hockel, Jeremiah D. Brown, and Eric G. Johnson
Appl. Opt. 45(1) 33-43 (2006)