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Comparison of two techniques for reliable characterization of thin metal–dielectric films |
Applied Optics, Vol. 50, Issue 33, pp. 6189-6197 (2011)
http://dx.doi.org/10.1364/AO.50.006189
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Abstract
In the present study we determine the optical parameters of thin metal–dielectric films using two different characterization techniques based on nonparametric and multiple oscillator models. We consider four series of thin metal–dielectric films produced under various deposition conditions with different optical properties. We compare characterization results obtained by nonparametric and multiple oscillator techniques and demonstrate that the results are consistent. The consistency of the results proves their reliability.
© 2011 Optical Society of America
OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.3915) Thin films : Metallic, opaque, and absorbing coatings
ToC Category:
Thin Films
History
Original Manuscript: July 28, 2011
Revised Manuscript: October 3, 2011
Manuscript Accepted: October 3, 2011
Published: November 15, 2011
Citation
Tatiana V. Amotchkina, Michael K. Trubetskov, Alexander V. Tikhonravov, Vesna Janicki, Jordi Sancho-Parramon, and Hrvoje Zorc, "Comparison of two techniques for reliable characterization of thin metal–dielectric films," Appl. Opt. 50, 6189-6197 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-33-6189
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