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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C1–C4

Fabrication of three-dimensional autocloned photonic crystal on sapphire substrate

Hao Ming Ku, Chen Yang Huang, and Shiuh Chao  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C1-C4 (2011)
http://dx.doi.org/10.1364/AO.50.0000C1


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Abstract

We applied the laser interference lithography method to form a patterned sapphire substrate (PSS). A three-dimensional photonic crystal was formed by autocloning the PSS with alternate Ta 2 O 5 / SiO 2 coatings. A high total integrated reflectance (TIR) band was obtained around the 410 to 470 nm wavelength range that matched the emission spectrum of the gallium nitride (GaN) light-emitting diode (LED) for application in manipulating the light extraction of the sapphire-based GaN LED.

© 2011 Optical Society of America

OCIS Codes
(230.3670) Optical devices : Light-emitting diodes
(310.1860) Thin films : Deposition and fabrication
(230.5298) Optical devices : Photonic crystals
(310.6845) Thin films : Thin film devices and applications

History
Original Manuscript: July 26, 2010
Manuscript Accepted: August 19, 2010
Published: September 30, 2010

Citation
Hao Ming Ku, Chen Yang Huang, and Shiuh Chao, "Fabrication of three-dimensional autocloned photonic crystal on sapphire substrate," Appl. Opt. 50, C1-C4 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C1


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References

  1. S. Kawakami, “Fabrication of submicrometer 3D periodic structures composed of Si/SiO2,” Electron. Lett. 33, 1260–1261 (1997). [CrossRef]
  2. M. Notomi, T. Tamamura, T. Kawashima, and S. Kawakami, “Drilled alternating-layer three-dimensional photonic crystals having a full photonic band gap,” Appl. Phys. Lett. 77, 4256–4258 (2000). [CrossRef]
  3. S. Kawakami, T. Kawashima, and T. Satoa, “Mechanism of shape formation of three-dimensional periodic nanostructures by bias sputtering,” Appl. Phys. Lett. 74, 463–465 (1999). [CrossRef]
  4. C. Y. Huang, H. M. Ku, and S. Chao, “Surface profile control of the autocloned photonic crystal by ion-beam-sputter deposition with radio-frequency-bias etching,” Appl. Opt. 48, 69–73(2009). [CrossRef]
  5. M. Notomi, A. Shinya, E. Kuramochi, I. Yokohama, C. Takahashi, K. Yamada, J. Takahasgi, T. Kawashima, and S. Kawakami, “Si-based photonic crystals and photonic-bandgap waveguides,” IEICE Trans. Electron. E85-C, 1025–1032(2002).
  6. K. Miura, Y. Ohtera, H. Ohkubo, T. Sato, N. Akutsu, M. Hikage, N. Ishino, T. Kawashima, and S. Kawakami, “Loss reduction of photonic crystal waveguide fabricated by the auto cloning technology,” Electron. Commun. Jpn. Part 2 Electron. 88, 10–20 (2005). [CrossRef]
  7. T. Sato, K. Miura, N. Ishino, Y. Ohtera, T. Tamamura, and S. Kawakami, “Photonic crystals for the visible range fabricated by autocloning technique and their application,” Opt. Quantum Electron. 34, 63–70 (2002). [CrossRef]
  8. H. Ohkubo, Y. Ohtera, S. Kawakami, T. Chiba, and H. Okano, “Integration and evaluation of multichannel photonic crystal wavelength filters consisting of autocloned Ta2O5/SiO2 multilayer thin films,” Jpn. J. Appl. Phys. 42, L1219–L1221 (2003). [CrossRef]
  9. O. Hanaizumi, Y. Ohtera, T. Sato, and S. Kawakami, “Propagation of light beams along line defects formed in a-Si/SiO2 three-dimensional photonic crystals: fabrication and observation,” Appl. Phys. Lett. 74, 777–779 (1999). [CrossRef]
  10. A. Fernandez, H. T. Nguyen, J. A. Britten, R. D. Boyd, M. D. Perry, D. R. Kania, and A. M. Hawryluk, “Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays,” J. Vac. Sci. Technol. B 15, 729–735 (1997). [CrossRef]
  11. M. Farhoud, J. Ferrera, A. J. Lochtefeld, T. E. Murphy, M. L. Schattenburg, J. Carter, C. A. Ross, and H. I. Smith, “Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist,” J. Vac. Sci. Technol. B 17, 3182–3185 (1999). [CrossRef]
  12. J. M. Lee, S. H. Oh, C. W. Lee, H. Ko, S. Park, K. S. Kim, and M. H. Park, “Fabrication of InGaAsP/InP two-dimensional periodic nanostructure with variable sizes and periods using laser holography and reactive ion etching,” Electrochem. Solid-State Lett. 7, G11 –G13 (2004). [CrossRef]
  13. C. Y. Huang, H. M. Ku, and S. Chao, “Light extraction enhancement for InGaN/GaN LED by three dimensional auto-cloned photonic crystal,” Opt. Express 17, 23702–23711(2009). [CrossRef]

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