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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C148–C153

Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers

Marcus Trost, Sven Schröder, Torsten Feigl, Angela Duparré, and Andreas Tünnermann  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C148-C153 (2011)
http://dx.doi.org/10.1364/AO.50.00C148


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Abstract

Scattering resulting from interface imperfections critically affects the image contrast and optical throughput of multilayer coatings for 13.5 nm . To investigate the scattering mechanisms, at-wavelength scattering measurements in combination with atomic force microscopy are analyzed for an in-depth characterization of the roughness properties. The different impacts of substrate finish and intrinsic thin film roughness on the scattering distribution are separated and analyzed in detail. Furthermore, a novel approach to characterize the roughness of large extreme ultraviolet substrates is presented, based on light scattering measurements at 442 nm .

© 2011 Optical Society of America

OCIS Codes
(120.6660) Instrumentation, measurement, and metrology : Surface measurements, roughness
(240.5770) Optics at surfaces : Roughness
(290.0290) Scattering : Scattering
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

History
Original Manuscript: August 2, 2010
Manuscript Accepted: September 29, 2010
Published: December 1, 2010

Virtual Issues
March 1, 2011 Spotlight on Optics

Citation
Marcus Trost, Sven Schröder, Torsten Feigl, Angela Duparré, and Andreas Tünnermann, "Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers," Appl. Opt. 50, C148-C153 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C148


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References

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