Low resistivity and high transmittance of Al-doped ZnO (AZO) and Ga-doped ZnO (GZO) transparent conductive thin films have been achieved by use of pulsed dc magnetron sputtering in a hydrogen environment at room temperature. The addition of hydrogen to the sputtering gas can reduce the re sistivity of the films and improve their electrical properties compared to those prepared without ${\mathrm{H}}_2$ , because the hydrogen acts a shallow donor. The average transmittance was over 85% in the visible region, and the lowest resistivity of the AZO and GZO films was $4.01\times {10}^{-4}(\mathrm{\Omega }\text{-}\mathrm{cm})$ and $4.39\times {10}^{-4}(\mathrm{\Omega }\text{-}\mathrm{cm})$ , respectively.