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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C210–C216

Analysis of long-term internal stress and film structure of SiO 2 optical thin films

Toshiyuki Nishikawa, Hiroi Ono, Hiroshi Murotani, Yoshitaka Iida, and Katsuhisa Okada  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C210-C216 (2011)
http://dx.doi.org/10.1364/AO.50.00C210


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Abstract

Recently, the demand for durability of optical thin films, which have long been used, has been growing as the performance of optical components improves. The stress of a film is an important parameter that is related to its adhesion. The electron beam (EB) and ion-assisted deposition (IAD) methods are widely used to fabricate optical thin films. However, there are few reports on long-term internal stress, despite the importance of this issue. Here we discuss the time dependence of the stress of SiO 2 optical thin films in terms of optical characteristics in the infrared region. It was found that SiO 2 thin films prepared by the EB and IAD methods exhibited compression stress. The Si–OH molecular bond was observed at around 930 cm 1 in the Fourier transform infrared spectroscopy spectrum of the sample prepared by the EB method, which exhibited a large change in internal stress after an elapsed time. It is considered that this change in bonding was related to the decrease in the stress of the films.

© 2011 Optical Society of America

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.4925) Thin films : Other properties (stress, chemical, etc.)
(310.6628) Thin films : Subwavelength structures, nanostructures

History
Original Manuscript: August 3, 2010
Revised Manuscript: October 30, 2010
Manuscript Accepted: November 4, 2010
Published: December 13, 2010

Citation
Toshiyuki Nishikawa, Hiroi Ono, Hiroshi Murotani, Yoshitaka Iida, and Katsuhisa Okada, "Analysis of long-term internal stress and film structure of SiO2 optical thin films," Appl. Opt. 50, C210-C216 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C210

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