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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C222–C227

In situ thickness determination of multilayered structures using single wavelength ellipsometry and reverse engineering

Daniel Rademacher, Michael Vergöhl, and Uwe Richter  »View Author Affiliations

Applied Optics, Vol. 50, Issue 9, pp. C222-C227 (2011)

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An in situ monitoring setup and process control loop were developed and integrated into a magnetron sputtering coater equipped with a Sentech SE 401 single wavelength ellipsometer, including the engineering of software for in situ process control to enhance production accuracy. By using that software, the system allows direct monitoring of the layer thickness on a moving substrate. It is shown that it is possible to determine the complex index of refraction from the distribution of measurements depending on the layer thickness. A strategy has been developed for in situ reverse thickness engineering of the top layers to compensate measurement errors.

© 2011 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

Original Manuscript: July 30, 2010
Revised Manuscript: November 9, 2010
Manuscript Accepted: November 12, 2010
Published: December 20, 2010

Daniel Rademacher, Michael Vergöhl, and Uwe Richter, "In situ thickness determination of multilayered structures using single wavelength ellipsometry and reverse engineering," Appl. Opt. 50, C222-C227 (2011)

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