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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C309–C315

Effects of substrate temperatures on the structure and properties of hafnium dioxide films

Hongfei Jiao, Xinbin Cheng, Jiangtao Lu, Ganghua Bao, Yongli Liu, Bin Ma, Pengfei He, and Zhanshan Wang  »View Author Affiliations

Applied Optics, Vol. 50, Issue 9, pp. C309-C315 (2011)

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Different HfO 2 monolayers under different deposition conditions, such as substrate temperature and oxygen partial pressure, were prepared from metal hafnium using the reactive electron beam evaporation method. X-ray diffraction was applied to determine the crystalline phase of these films, the surface morphology of the samples was examined by atomic force microscopy, and the optical properties were analyzed using a spectrophotometer and the surface thermal lens technique. The relationship between substrate temperature and film characteristic was investigated, and the correlation between the observed film properties and the laser damage threshold was also discussed.

© 2011 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

Original Manuscript: August 2, 2010
Revised Manuscript: November 20, 2010
Manuscript Accepted: December 6, 2010
Published: January 24, 2011

Hongfei Jiao, Xinbin Cheng, Jiangtao Lu, Ganghua Bao, Yongli Liu, Bin Ma, Pengfei He, and Zhanshan Wang, "Effects of substrate temperatures on the structure and properties of hafnium dioxide films," Appl. Opt. 50, C309-C315 (2011)

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