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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C31–C35

Plasma-etched organic layers for antireflection purposes

Ulrike Schulz, Christiane Präfke, Christoph Gödeker, Norbert Kaiser, and Andreas Tünnermann  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C31-C35 (2011)
http://dx.doi.org/10.1364/AO.50.000C31


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Abstract

Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.

© 2011 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.1860) Thin films : Deposition and fabrication
(310.6188) Thin films : Spectral properties
(310.6628) Thin films : Subwavelength structures, nanostructures

History
Original Manuscript: July 28, 2010
Revised Manuscript: September 6, 2010
Manuscript Accepted: September 7, 2010
Published: October 8, 2010

Citation
Ulrike Schulz, Christiane Präfke, Christoph Gödeker, Norbert Kaiser, and Andreas Tünnermann, "Plasma-etched organic layers for antireflection purposes," Appl. Opt. 50, C31-C35 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C31

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