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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C321–C328

Instrument for close-to-process light scatter measurements of thin film coatings and substrates

Alexander von Finck, Matthias Hauptvogel, and Angela Duparré  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C321-C328 (2011)
http://dx.doi.org/10.1364/AO.50.00C321


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Abstract

Scatter analysis is an effective method for the characterization of thin film components. The new highly sensitive table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance, Reflectance and Optical Scatter Measurement—Table Top) has been developed at the Fraunhofer Institute in Jena to meet the specific requirements for close-to-process applications. Extremely high sensitivity with a noise equivalent angle resolved scatter level of 2 × 10 8     sr 1 , full three-dimensional spherical measurement capability, and an instrument size as small as 0.8 m × 0.8 m × 0.8 m have been achieved. Details of specifications, optical components, and software are presented, including a comparison to our laboratory system. Anisotropy analysis of diamond-turned aluminum substrates as well as substrate and coating characterization are demonstrated as examples of application.

© 2011 Optical Society of America

OCIS Codes
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.5770) Optics at surfaces : Roughness
(290.0290) Scattering : Scattering
(290.5820) Scattering : Scattering measurements
(310.0310) Thin films : Thin films

History
Original Manuscript: July 30, 2010
Revised Manuscript: December 10, 2010
Manuscript Accepted: December 10, 2010
Published: January 28, 2011

Citation
Alexander von Finck, Matthias Hauptvogel, and Angela Duparré, "Instrument for close-to-process light scatter measurements of thin film coatings and substrates," Appl. Opt. 50, C321-C328 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C321

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