Abstract

A reactive electron beam evaporation process was used to fabricate $1.064\mathrm{\mu m}$ ${\mathrm{HfO}}_2/{\mathrm{SiO}}_2$ high reflectors. The deposition process was optimized to reduce the nodular density. Cross-sectioning of nodular defects by a focused ion-beam milling instrument showed that the nodule seeds were the residual particles on the substrate and the particulates from the silica source “splitting.” After optimizing the substrate preparation procedure and the evaporation process, a low nodular density of $2.7/{\mathrm{mm}}^2$ was achieved. The laser damage test revealed that the ejection fluences and damage growth behaviors of nodules created from deep or shallow seeds were totally different. A mechanism based on directional plasma scald was proposed to interpret observed damage growth phenomenon.

© 2011 Optical Society of America

Influence of composition and seed dimension on the structure and laser damage of nodular defects in HfO₂/SiO₂ high reflectors

Chaoyang Wei, Kui Yi, Zhengxiu Fan, and Jianda Shao
Appl. Opt. 51(28) 6781-6788 (2012)

Comparative study of Laser induce damage of HfO₂/SiO₂ and TiO₂/SiO₂ mirrors at 1064 nm

Hongfei Jiao, Tao Ding, and Qian Zhang
Opt. Express 19(5) 4059-4066 (2011)

Investigations on the catastrophic damage in multilayer dielectric films

Xiaofeng Liu, Yuan’an Zhao, Yanqi Gao, Dawei Li, Guohang Hu, Meiping Zhu, Zhengxiu Fan, and Jianda Shao
Appl. Opt. 52(10) 2194-2199 (2013)

Characteristics of plasma scalds in multilayer dielectric films

Xiaofeng Liu, Yuan’an Zhao, Dawei Li, Guohang Hu, Yanqi Gao, Zhengxiu Fan, and Jianda Shao
Appl. Opt. 50(21) 4226-4231 (2011)

Geometrical characteristics and damage morphology of nodules grown from artificial seeds in multilayer coating

Yongguang Shan, Hongbo He, Chaoyang Wei, Shuhong Li, Ming Zhou, Dawei Li, and Yuan’an Zhao
Appl. Opt. 49(22) 4290-4295 (2010)