A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.
© 2011 Optical Society of America
Original Manuscript: August 2, 2010
Manuscript Accepted: August 26, 2010
Published: October 14, 2010
Jonathan R. Birge, Franz X. Kärtner, and Omid Nohadani, "Improving thin-film manufacturing yield with robust optimization," Appl. Opt. 50, C36-C40 (2011)