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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C396–C402

Implementation of long-wavelength cut-off filters based on critical angle

Yanen Guo, J. A. Dobrowolski, Li Li, Daniel Poitras, and Tom Tiwald  »View Author Affiliations

Applied Optics, Vol. 50, Issue 9, pp. C396-C402 (2011)

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Our first attempts at the fabrication of long-wavelength infrared cut-off filters with extended transmission and rejection regions that are based on the use of the critical angle, the dispersion of refractive indices, and on thin-film interference were not very successful. The design of the filter consisted of layers placed at the interface between two high-index prisms. Using the available deposition equipment, the layers produced were porous and very rough. The pores adsorbed water vapor, which resulted in absorption. The roughness made the process of optical contacting very difficult. In this paper we describe the adjustments in the design and deposition processes that allowed us to obtain filters with a better and more stable performance.

© 2011 Optical Society of America

OCIS Codes
(120.2440) Instrumentation, measurement, and metrology : Filters
(260.2030) Physical optics : Dispersion
(260.6970) Physical optics : Total internal reflection
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
(240.1485) Optics at surfaces : Buried interfaces

Original Manuscript: August 4, 2010
Manuscript Accepted: September 1, 2010
Published: February 18, 2011

Yanen Guo, J. A. Dobrowolski, Li Li, Daniel Poitras, and Tom Tiwald, "Implementation of long-wavelength cut-off filters based on critical angle," Appl. Opt. 50, C396-C402 (2011)

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