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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C420–C423

Spectral polarimetry technique as a complementary tool to ellipsometry of dielectric films

Marcelo B. Pereira, Bruno J. Barreto, and Flavio Horowitz  »View Author Affiliations


Applied Optics, Vol. 50, Issue 9, pp. C420-C423 (2011)
http://dx.doi.org/10.1364/AO.50.00C420


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Abstract

Ellipsometry is a highly sensitive optical technique for coating characterization but usually presents multiple solutions in many cases. To prevent these, a method with addition of a spectral polarimetric technique is proposed. An initial film dispersion curve, independently of its physical thickness, is then provided using the same setup as spectral ellipsometry and at the same sample position, which later is used for thickness determination and dispersion refinement with increase of reliability of results. Characterization of thin TiO 2 films with one and two ellipsometric solutions is shown to corroborate the validity of the proposed method.

© 2011 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.6860) Thin films : Thin films, optical properties

History
Original Manuscript: January 13, 2011
Manuscript Accepted: January 13, 2011
Published: March 9, 2011

Citation
Marcelo B. Pereira, Bruno J. Barreto, and Flavio Horowitz, "Spectral polarimetry technique as a complementary tool to ellipsometry of dielectric films," Appl. Opt. 50, C420-C423 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C420


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References

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