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Spectral polarimetry technique as a complementary tool to ellipsometry of dielectric films |
Applied Optics, Vol. 50, Issue 9, pp. C420-C423 (2011)
http://dx.doi.org/10.1364/AO.50.00C420
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Abstract
Ellipsometry is a highly sensitive optical technique for coating characterization but usually presents multiple solutions in many cases. To prevent these, a method with addition of a spectral polarimetric technique is proposed. An initial film dispersion curve, independently of its physical thickness, is then provided using the same setup as spectral ellipsometry and at the same sample position, which later is used for thickness determination and dispersion refinement with increase of reliability of results. Characterization of thin
© 2011 Optical Society of America
OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.6860) Thin films : Thin films, optical properties
History
Original Manuscript: January 13, 2011
Manuscript Accepted: January 13, 2011
Published: March 9, 2011
Citation
Marcelo B. Pereira, Bruno J. Barreto, and Flavio Horowitz, "Spectral polarimetry technique as a complementary tool to ellipsometry of dielectric films," Appl. Opt. 50, C420-C423 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C420
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