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Combined in situ and ex situ optical data analysis of magnesium fluoride coatings deposited by plasma ion assisted deposition |
Applied Optics, Vol. 50, Issue 9, pp. C5-C10 (2011)
http://dx.doi.org/10.1364/AO.50.0000C5
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Abstract
The combination of in situ spectrophotometry during film deposition and ex situ spectrophotometry allows insight into the depth distribution of optical losses in plasma ion assisted deposition coatings. An adapted optical characterization strategy for absorbing coatings using only in situ transmittance data has been developed and is exemplified in application to magnesium fluoride coatings. Measurements and simulation results strongly indicate an increased absorption caused by local understoichiometry of the fluoride material close to the fused silica substrate.
© 2011 Optical Society of America
OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.3915) Thin films : Metallic, opaque, and absorbing coatings
History
Original Manuscript: July 21, 2010
Manuscript Accepted: August 16, 2010
Published: October 1, 2010
Citation
Steffen Wilbrandt, Olaf Stenzel, Martin Bischoff, and Norbert Kaiser, "Combined in situ and ex situ optical data analysis of magnesium fluoride coatings deposited by plasma ion assisted deposition," Appl. Opt. 50, C5-C10 (2011)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-50-9-C5
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