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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 50, Iss. 9 — Mar. 20, 2011
  • pp: C50–C54

Design and fabrication of multichannel Si / Si O 2 autocloned photonic crystal edge filters

Yasuo Ohtera, Daniel Kurniatan, and Hirohito Yamada  »View Author Affiliations

Applied Optics, Vol. 50, Issue 9, pp. C50-C54 (2011)

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An Si / Si O 2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190 nm in the near infrared region ( 1300 1500 nm ) is experimentally demonstrated.

© 2011 Optical Society of America

OCIS Codes
(230.4170) Optical devices : Multilayers
(350.2460) Other areas of optics : Filters, interference
(050.5298) Diffraction and gratings : Photonic crystals

Original Manuscript: July 22, 2010
Revised Manuscript: August 29, 2010
Manuscript Accepted: September 17, 2010
Published: October 25, 2010

Yasuo Ohtera, Daniel Kurniatan, and Hirohito Yamada, "Design and fabrication of multichannel Si/SiO2autocloned photonic crystal edge filters," Appl. Opt. 50, C50-C54 (2011)

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