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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 10 — Apr. 1, 2012
  • pp: 1479–1486

Kernel-based parametric analytical model of source intensity distributions in lithographic tools

Shiyuan Liu, Wei Liu, Xinjiang Zhou, and Peng Gong  »View Author Affiliations


Applied Optics, Vol. 51, Issue 10, pp. 1479-1486 (2012)
http://dx.doi.org/10.1364/AO.51.001479


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Abstract

This paper proposes a parametric analytical source model for overall representation of the physical distribution property of partially coherent illumination sources in lithographic tools. A set of smooth kernels is adopted to construct the analytical model for the multiple mainstream illumination sources. Corrected parametrical terms are subsequently presented for characterization of different physical distortions of and deviations from actual illumination sources. The corrected parametrical terms can be decomposed into Fourier series, which have special physical meanings of respectively indicating different distortion types, including shift of the center, tilt, and ellipticity, etc. We fully expected that the proposed analytical model will provide both simulation conditions and a theoretical basis for the resolution enhancement technique and related research fields.

© 2012 Optical Society of America

OCIS Codes
(110.2990) Imaging systems : Image formation theory
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(230.6080) Optical devices : Sources

ToC Category:
Imaging Systems

History
Original Manuscript: October 24, 2011
Revised Manuscript: December 10, 2011
Manuscript Accepted: December 11, 2011
Published: March 23, 2012

Citation
Shiyuan Liu, Wei Liu, Xinjiang Zhou, and Peng Gong, "Kernel-based parametric analytical model of source intensity distributions in lithographic tools," Appl. Opt. 51, 1479-1486 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-10-1479

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