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Applied Optics

Applied Optics


  • Vol. 51, Iss. 12 — Apr. 20, 2012
  • pp: 1997–2003

Fabrication and properties of ITO films treated by excited atomic oxygen

Valeriy A. Sterligov, Evgeny V. Shun’ko, Iaroslav O. Grytsaienko, and Leonid V. Poperenko  »View Author Affiliations

Applied Optics, Vol. 51, Issue 12, pp. 1997-2003 (2012)

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We consider the crystallization of ITO films induced by excited atomic oxygen. Owing to it, transmittance of these films in visible ranges increased by 20% and surface impedance dropped from 36 down to 4.6Ω/□. The treatment temperature (127 °C) was significantly below that of conventional crystallization (320 °C). Application of elastic light scattering diagnostics shows that rms surface roughness increased from 2.65 nm up to 4.07 nm after film treatment. ITO treatment does not change isotropic azimuthal structure of the surface.

© 2012 Optical Society of America

OCIS Codes
(290.5880) Scattering : Scattering, rough surfaces
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties
(310.7005) Thin films : Transparent conductive coatings

ToC Category:

Original Manuscript: September 15, 2011
Revised Manuscript: December 6, 2011
Manuscript Accepted: December 12, 2011
Published: April 12, 2012

Valeriy A. Sterligov, Evgeny V. Shun’ko, Iaroslav O. Grytsaienko, and Leonid V. Poperenko, "Fabrication and properties of ITO films treated by excited atomic oxygen," Appl. Opt. 51, 1997-2003 (2012)

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