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Numerical simulation of millisecond laser-induced damage in silicon-based positive-intrinsic-negative photodiode |
Applied Optics, Vol. 51, Issue 14, pp. 2759-2766 (2012)
http://dx.doi.org/10.1364/AO.51.002759
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Abstract
An axisymmetric mathematical model was established for millisecond-pulsed Nd:YAG laser heating of silicon-based positive-intrinsic-negative photodiode. The transient temperature fields were obtained by using the finite element method. The temperature dependences of the material parameters and the absorption coefficient were taken into account in the calculation. The results indicate that the optical absorption coefficient and the thermal conductivity are the two key factors for the temperature evolution. The diffusion of boron in the liquid phase and the introduction of deep-level defects in the depletion region of the photodiode were the two reasons for the millisecond laser-induced electrical degradation of the photodiode. The morphological damage threshold and electrical degradation threshold of the photodiode were obtained numerically. Meanwhile, the influence of the antireflection coating, the doping concentration, and the junction depth were also considered. The results show that the morphological damage threshold decreases with adding an antireflection coating, the increase of the doping concentration, and junction depth. The electrical degradation threshold increases only with the junction depth.
© 2012 Optical Society of America
OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(230.5170) Optical devices : Photodiodes
ToC Category:
Optical Devices
History
Original Manuscript: January 19, 2012
Manuscript Accepted: March 9, 2012
Published: May 10, 2012
Citation
Zewen Li, Xi Wang, Zhonghua Shen, Jian Lu, and Xiaowu Ni, "Numerical simulation of millisecond laser-induced damage in silicon-based positive-intrinsic-negative photodiode," Appl. Opt. 51, 2759-2766 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-14-2759
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