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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 15 — May. 20, 2012
  • pp: 2865–2869

Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation

Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano  »View Author Affiliations


Applied Optics, Vol. 51, Issue 15, pp. 2865-2869 (2012)
http://dx.doi.org/10.1364/AO.51.002865


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Abstract

LaF3 thin films at 193 nm were deposited by the molybdenum boat evaporation with ion-assisted deposition (IAD). Various optical characteristics, stress, and microstructures that formed under different ion-beam voltages of IAD deposition were investigated. The relation between these properties is also discussed. LaF3 films deposited with IAD exhibited small rough surfaces and large optical loss at 193 nm. The largest value of optical loss for films at 193 nm, which were prepared at an ion-beam voltage of 400 V, was 1.55% and the extinction coefficient was smaller than 0.0015. Microstructures and crystalline structures of films were influenced and changed by the ion-assisted deposition process. Tensile stress value of films increased as the ion-beam voltage rose. Refractive index, related to the packing density and microstructures, also increased as the ion-beam voltage rose.

© 2012 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.6870) Thin films : Thin films, other properties

ToC Category:
Thin Films

History
Original Manuscript: January 20, 2012
Revised Manuscript: March 13, 2012
Manuscript Accepted: March 14, 2012
Published: May 15, 2012

Citation
Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide Nakahira, and Yuuichi Takano, "Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation," Appl. Opt. 51, 2865-2869 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-15-2865

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