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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 18 — Jun. 20, 2012
  • pp: 4028–4041

Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures

Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord  »View Author Affiliations


Applied Optics, Vol. 51, Issue 18, pp. 4028-4041 (2012)
http://dx.doi.org/10.1364/AO.51.004028


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Abstract

Multibeam interference represents an approach for producing one-, two-, and three-dimensional periodic optical-intensity distributions with submicrometer features and periodicities. Accordingly, interference lithography (IL) has been used in a wide variety of applications, typically requiring additional lithographic steps to modify the periodic interference pattern and create integrated functional elements. In the present work, pattern-integrated interference lithography (PIIL) is introduced. PIIL is the integration of superposed pattern imaging with IL. Then a pattern-integrated interference exposure system (PIIES) is presented that implements PIIL by incorporating a projection imaging capability in a novel three-beam interference configuration. The purpose of this system is to fabricate, in a single-exposure step, a two-dimensional periodic photonic-crystal lattice with nonperiodic functional elements integrated into the periodic pattern. The design of the basic system is presented along with a model that simulates the resulting optical-intensity distribution at the system sample plane where the three beams simultaneously interfere and integrate a superposed image of the projected mask pattern. Appropriate performance metrics are defined in order to quantify the characteristics of the resulting photonic-crystal structure. These intensity and lattice-vector metrics differ markedly from the metrics used to evaluate traditional photolithographic imaging systems. Simulation and experimental results are presented that demonstrate the fabrication of example photonic-crystal structures in a single-exposure step. Example well-defined photonic-crystal structures exhibiting favorable intensity and lattice-vector metrics demonstrate the potential of PIIL for fabricating dense integrated optical circuits.

© 2012 Optical Society of America

OCIS Codes
(070.0070) Fourier optics and signal processing : Fourier optics and signal processing
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.2945) Optical design and fabrication : Illumination design
(110.3925) Imaging systems : Metrics
(230.5298) Optical devices : Photonic crystals

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: March 14, 2012
Manuscript Accepted: April 21, 2012
Published: June 12, 2012

Citation
Guy M. Burrow, Matthieu C. R. Leibovici, and Thomas K. Gaylord, "Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures," Appl. Opt. 51, 4028-4041 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-18-4028


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