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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 19 — Jul. 1, 2012
  • pp: 4430–4435

Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell

Zhida Xu, Jing Jiang, and Gang Logan Liu  »View Author Affiliations

Applied Optics, Vol. 51, Issue 19, pp. 4430-4435 (2012)

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A high-density and -uniformity sub-100 nm surface-oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on a photovoltaic device surface by a one-step high-throughput plasma-enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short-circuit current increased by 7.1%, fill factor increased by 7.0%, and conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low-cost and high-throughput nanomanufacturing technology.

© 2012 Optical Society of America

OCIS Codes
(160.6000) Materials : Semiconductor materials
(310.6628) Thin films : Subwavelength structures, nanostructures
(240.6695) Optics at surfaces : Surface-enhanced Raman scattering

ToC Category:
Optics at Surfaces

Original Manuscript: March 19, 2012
Manuscript Accepted: May 26, 2012
Published: June 27, 2012

Zhida Xu, Jing Jiang, and Gang Logan Liu, "Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell," Appl. Opt. 51, 4430-4435 (2012)

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