A high-density and -uniformity sub-100 nm surface-oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on a photovoltaic device surface by a one-step high-throughput plasma-enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short-circuit current increased by 7.1%, fill factor increased by 7.0%, and conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low-cost and high-throughput nanomanufacturing technology.
© 2012 Optical Society of America
Optics at Surfaces
Original Manuscript: March 19, 2012
Manuscript Accepted: May 26, 2012
Published: June 27, 2012
Zhida Xu, Jing Jiang, and Gang Logan Liu, "Lithography-free sub-100 nm nanocone array antireflection layer for low-cost silicon solar cell," Appl. Opt. 51, 4430-4435 (2012)