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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 23 — Aug. 10, 2012
  • pp: 5668–5675

Sensitivity analysis of thin-film thickness measurement by vertical scanning white-light interferometry

Jing-tao Dong and Rong-sheng Lu  »View Author Affiliations


Applied Optics, Vol. 51, Issue 23, pp. 5668-5675 (2012)
http://dx.doi.org/10.1364/AO.51.005668


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Abstract

The spectral nonlinear phase method and the Fourier amplitude method have been applied to measure the thin-film thickness profile in vertical scanning white-light interferometry (VSWLI). However, both the methods have their disadvantages, and accordingly their applications are limited. In the paper we have investigated the dependence of the sensitivities of both the methods on the thin-film thickness and refractive index, the objective numerical aperture, and the incident light spectral range of VSWLI. The relation of the Fresnel reflection coefficients on the wavelength effect is also discussed. Some important research results reveal that the combination of both Fourier amplitude and nonlinear phase methods may provide a new approach to improve the VSWLI measurement sensitivity for thin-film thickness profile.

© 2012 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(240.0310) Optics at surfaces : Thin films
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: April 19, 2012
Revised Manuscript: June 15, 2012
Manuscript Accepted: July 15, 2012
Published: August 6, 2012

Citation
Jing-tao Dong and Rong-sheng Lu, "Sensitivity analysis of thin-film thickness measurement by vertical scanning white-light interferometry," Appl. Opt. 51, 5668-5675 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-23-5668

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