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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 27 — Sep. 20, 2012
  • pp: 6683–6690

Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings

Yunxia Jin, Heyuan Guan, Fanyu Kong, Jianpeng Wang, Andreas Erdmann, Shijie Liu, Yin Du, Jianda Shao, Hongbo He, and Kui Yi  »View Author Affiliations


Applied Optics, Vol. 51, Issue 27, pp. 6683-6690 (2012)
http://dx.doi.org/10.1364/AO.51.006683


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Abstract

Internal electric-field enhancement is critical for the laser-induced damage properties of multilayer dielectric compression gratings (MDG) in high-energy laser systems. Due to the complex fabrication processes of MDGs, such as coating, interference lithography, etching, and cleaning, different kinds of defects in multilayers or profiles on MDG surfaces can’t be practically avoided. Combined with a scanning electron microscope of some MDG samples, line-absence and added node seem to be two typical defects, according to which two defective MDG models are established, and numerical calculations are performed. From simulation results, the defect period and defect depth has little effect on the spectral response of the optical elements. However, they may produce large changes of internal electric-field distribution on the grating surface and even in multilayer structures, thus decreasing the damage threshold of MDG. To obtain a better understanding of the dependence of the internal electric-field enhancement on these defects, this work is focused on the near-field distributions of defective MDGs using the Fourier model method.

© 2012 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(140.3330) Lasers and laser optics : Laser damage
(230.1950) Optical devices : Diffraction gratings
(230.4170) Optical devices : Multilayers
(320.5520) Ultrafast optics : Pulse compression

ToC Category:
Diffraction and Gratings

History
Original Manuscript: March 6, 2012
Revised Manuscript: June 17, 2012
Manuscript Accepted: July 10, 2012
Published: September 20, 2012

Citation
Yunxia Jin, Heyuan Guan, Fanyu Kong, Jianpeng Wang, Andreas Erdmann, Shijie Liu, Yin Du, Jianda Shao, Hongbo He, and Kui Yi, "Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings," Appl. Opt. 51, 6683-6690 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-27-6683

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