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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 28 — Oct. 1, 2012
  • pp: 6789–6798

Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride

Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink  »View Author Affiliations


Applied Optics, Vol. 51, Issue 28, pp. 6789-6798 (2012)
http://dx.doi.org/10.1364/AO.51.006789


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Abstract

The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54–14.29 μm (7006500cm1). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design.

© 2012 Optical Society of America

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: June 4, 2012
Revised Manuscript: August 27, 2012
Manuscript Accepted: August 28, 2012
Published: September 26, 2012

Citation
Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink, "Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride," Appl. Opt. 51, 6789-6798 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-28-6789

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