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Impact of LOCOS techniques on photonic wire waveguides |
Applied Optics, Vol. 51, Issue 29, pp. 7089-7093 (2012)
http://dx.doi.org/10.1364/AO.51.007089
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Abstract
We use the LOCal oxidation of silicon (LOCOS) method as a fabrication technique to define submicrometer photonic waveguides. We attempted fabricating the wire waveguides with two different masking processes, one with a stack of pad oxide and silicon nitride layers, and the other with a single silicon nitride layer. The smallest waveguide we achieved had a cross-section profile of
© 2012 Optical Society of America
OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.7370) Optical devices : Waveguides
(250.5300) Optoelectronics : Photonic integrated circuits
ToC Category:
Optical Devices
History
Original Manuscript: July 12, 2012
Revised Manuscript: September 5, 2012
Manuscript Accepted: September 7, 2012
Published: October 9, 2012
Citation
Yule Xiong, Marc Ibrahim, and Winnie N. Ye, "Impact of LOCOS techniques on photonic wire waveguides," Appl. Opt. 51, 7089-7093 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-29-7089
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