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Fabrication of two-dimensional superposed microstructure by interference lithography |
Applied Optics, Vol. 51, Issue 3, pp. 302-305 (2012)
http://dx.doi.org/10.1364/AO.51.000302
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Abstract
In this paper, we report the basic theory and method of single exposure interference lithography (IL) to fabricate two-dimensional (2D) superposed microstructures. Distribution of six-beam interference intensities with different azimuth angle is discussed, and 2D superposed microstructures with different periodic constants are obtained by computer simulations. The experiment results using CHP-C positive photoresist show a 2D superposed photonic crystal composed of a periodically repeated hexagonal pattern of hexagonal lattice cells, which is in close agreement with the computer simulation. Fabrication of a superposed structure by single exposure IL paves the way for studying 2D photonic crystal fabrication, surface lasing, optical waveguides, and so on.
© 2012 Optical Society of America
OCIS Codes
(090.2880) Holography : Holographic interferometry
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication
(160.5298) Materials : Photonic crystals
ToC Category:
Holography
History
Original Manuscript: July 28, 2011
Revised Manuscript: October 25, 2011
Manuscript Accepted: October 25, 2011
Published: January 16, 2012
Citation
Hao Lü, Qiu-Ling Zhao, Qing-Yue Zhang, Dong-Jie Niu, and Xia Wang, "Fabrication of two-dimensional superposed microstructure by interference lithography," Appl. Opt. 51, 302-305 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-3-302
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