OSA's Digital Library

Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 34 — Dec. 1, 2012
  • pp: 8203–8210

Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach

Carsten Schmitz, Henrik Ehlers, and Detlev Ristau  »View Author Affiliations

Applied Optics, Vol. 51, Issue 34, pp. 8203-8210 (2012)

View Full Text Article

Enhanced HTML    Acrobat PDF (640 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.

© 2012 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: September 5, 2012
Revised Manuscript: November 1, 2012
Manuscript Accepted: November 2, 2012
Published: November 30, 2012

Carsten Schmitz, Henrik Ehlers, and Detlev Ristau, "Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach," Appl. Opt. 51, 8203-8210 (2012)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. A. V. Tikhonravov, M. K. Trubetskov, M. A. Kokarev, T. V. Amotchkina, A. Duparré, E. Quesnel, D. Ristau, and S. Günster, “Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films,” Appl. Opt. 41, 2555–2560 (2002). [CrossRef]
  2. A. V. Tikonrahvov, M. K. Trubetskov, and T. V. Amotchkina, “Investigation of the effect of accumulation of thickness errors in optical coating production by broadband optical monitoring,” Appl. Opt. 45, 7026–7034 (2006). [CrossRef]
  3. A. V. Tikhonravov and M. K. Trubetskov, “Computational manufacturing as a bridge between design and production,” Appl. Opt. 44, 6877–6884 (2005). [CrossRef]
  4. K. Friedrich, S. Willbrandt, O. Stenzel, N. Kaiser, and K. H. Hoffmann, “Computational manufacturing of optical interference coatings: methods, simulation results, and comparison with experiment,” Appl. Opt. 49, 3150–3162 (2010). [CrossRef]
  5. D. Poelman and P. F. Smet, “Methods for the determination of the optical constants of thin films from single transmission measurements: a critical review,” J. Phys. D: Appl. Phys. 36, 1850–1857 (2003). [CrossRef]
  6. A. Zoeller, R. Goetzelmann, R. Herrmann, and K. Matl, “Large-area IAD with a new plasma source,” Proc. SPIE 1270, 204–210 (1990). [CrossRef]
  7. H. A. Macleod, “Monitoring of optical coatings,” Appl. Opt. 20, 82–89 (1981). [CrossRef]
  8. B. Vidal, A. Fornier, and E. Pelletier, “Wideband optical monitoring of nonquarterwave multilayer filters,” Appl. Opt. 18, 3851–3856 (1979).
  9. K. Starke, T. Gross, M. Lappschies, and D. Ristau, “Rapid prototyping of optical thin film filters,” Proc. SPIE 4094, 83–92 (2000). [CrossRef]
  10. M. Lappschies, T. Gross, H. Ehlers, and D. Ristau, “Broadband optical monitoring for the deposition of complex coatings,” Proc. SPIE 5250, 637–645 (2004). [CrossRef]
  11. D. Ristau, H. Ehlers, T. Gross, and M. Lappschies, “Optical broadband monitoring of conventional and ion processes,” Appl. Opt. 45, 1495–1501 (2006). [CrossRef]
  12. H. Ehlers, S. Schlichting, C. Schmitz, and D. Ristau, “Adaptive manufacturing of high-precision optics based on virtual deposition and hybrid process control techniques,” Chin. Opt. Lett. 8, 62–66 (2010). [CrossRef]
  13. S. Schlichting, K. Heinrich, H. Ehlers, and D. Ristau, “Online re-optimization as a powerful part of enhanced strategies in optical broadband monitoring,” Proc. SPIE 8168, 81681E (2011). [CrossRef]
  14. B. Tatian, “Fitting refractive-index data with the Sellmeier dispersion formula,” Appl. Opt. 23, 4477–4485 (1984). [CrossRef]
  15. J.-S. Chen, S. Chao, J.-S. Kao, H. Niu, and C. H. Chen, “Mixed films of TiO2-SiO2 deposited by double electron-beam coevaporation,” Appl. Phys. 35, 90–96 (1996).
  16. D. A. G. Bruggeman, “Berechnung physikalischer Konstanten von heterogenen Substanzen,” Ann. Phys. 24, 636–664 (1935). [CrossRef]
  17. W. M. Haynes, ed., “Index of refraction of water,” in Handbook of Chemistry and Physics (CRC, 2012), pp. 10–244.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited