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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 34 — Dec. 1, 2012
  • pp: 8203–8210

Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach

Carsten Schmitz, Henrik Ehlers, and Detlev Ristau  »View Author Affiliations


Applied Optics, Vol. 51, Issue 34, pp. 8203-8210 (2012)
http://dx.doi.org/10.1364/AO.51.008203


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Abstract

If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.

© 2012 Optical Society of America

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: September 5, 2012
Revised Manuscript: November 1, 2012
Manuscript Accepted: November 2, 2012
Published: November 30, 2012

Citation
Carsten Schmitz, Henrik Ehlers, and Detlev Ristau, "Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach," Appl. Opt. 51, 8203-8210 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-34-8203

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