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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 35 — Dec. 10, 2012
  • pp: 8481–8489

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Jian Sun, Xu Li, Weili Zhang, Kui Yi, and Jianda Shao  »View Author Affiliations

Applied Optics, Vol. 51, Issue 35, pp. 8481-8489 (2012)

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Aluminum fluoride (AlF3) is a low-refractive-index material widely used in coatings for deep-ultraviolet (DUV) optical systems, especially 193 nm laser systems. Low optical loss and stability are essential for film application. In this study, AlF3 thin films were prepared by thermal evaporation with a resistive heating boat. The effects of substrate temperatures and deposition rates on the optical properties in vacuum and in air, composition, and microstructures were discussed respectively. In vacuum the deposition parameters directly influenced the microstructures that determined the refractive index. When the films were exposed to air, aluminum oxide (Al2O3) formed in the films with water adsorption. Thus the refractive index increased and a nonmonotonic changing trend of the refractive index with substrate temperature was observed. The Al2O3 was also found to be conductive to reducing absorption loss. AlF3 films prepared at a high substrate temperature and deposition rate could yield stable structures with large optical loss.

© 2012 Optical Society of America

OCIS Codes
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties
(310.4925) Thin films : Other properties (stress, chemical, etc.)

ToC Category:
Thin Films

Original Manuscript: July 11, 2012
Revised Manuscript: November 10, 2012
Manuscript Accepted: November 14, 2012
Published: December 10, 2012

Jian Sun, Xu Li, Weili Zhang, Kui Yi, and Jianda Shao, "Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region," Appl. Opt. 51, 8481-8489 (2012)

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