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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 36 — Dec. 20, 2012
  • pp: 8541–8548

Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors

Jeroen Bosgra, Erwin Zoethout, Ad M. J. van der Eerden, Jan Verhoeven, Robbert W. E. van de Kruijs, Andrey E. Yakshin, and Fred Bijkerk  »View Author Affiliations

Applied Optics, Vol. 51, Issue 36, pp. 8541-8548 (2012)

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We studied the structure and optical properties of B4C/Mo/Y/Si multilayer systems. Using extended x-ray absorption fine structure measurements at the Y and Mo K-edge, the structure of the subnanometer thick Y layer and the underlying Mo layer were analyzed. It was found that even a 0.2 nm thick Y layer significantly reduced silicon diffusion toward Mo, thus reducing Mo silicide formation. Hard x-ray reflectometry showed that the difference in average interface roughness of the B4C/Mo/Y/Si multilayer structure compared to Mo/Si and B4C/Mo/B4C/Si multilayer structures was negligible. Soft x-ray reflectometry showed optical improvement of B4C/Mo/Y/Si with respect to Mo/Si and B4C/Mo/B4C/Si multilayer structures.

© 2012 Optical Society of America

OCIS Codes
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
X-ray Optics

Original Manuscript: November 12, 2012
Revised Manuscript: November 12, 2012
Manuscript Accepted: November 16, 2012
Published: December 13, 2012

Jeroen Bosgra, Erwin Zoethout, Ad M. J. van der Eerden, Jan Verhoeven, Robbert W. E. van de Kruijs, Andrey E. Yakshin, and Fred Bijkerk, "Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors," Appl. Opt. 51, 8541-8548 (2012)

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