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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 36 — Dec. 20, 2012
  • pp: 8579–8586

Application of white-light scanning interferometer on transparent thin-film measurement

Meng-Chi Li, Der-Shen Wan, and Cheng-Chung Lee  »View Author Affiliations

Applied Optics, Vol. 51, Issue 36, pp. 8579-8586 (2012)

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A method to measure thin-film thickness, refractive index, and dispersion constants based on white-light interferometry is described. The thin-film property is retrieved from the Fourier amplitude of the white-light correlogram. The sources of errors in Fourier amplitude, which include the accuracy of wave number, light source variation in time, and illumination nonuniformity, are investigated. With all these errors reduced, the film thicknesses and refractive indices of four samples measured by white-light interferometry are within 1% of the ellipsometry results.

© 2012 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(240.0310) Optics at surfaces : Thin films
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: August 20, 2012
Revised Manuscript: October 15, 2012
Manuscript Accepted: November 14, 2012
Published: December 14, 2012

Meng-Chi Li, Der-Shen Wan, and Cheng-Chung Lee, "Application of white-light scanning interferometer on transparent thin-film measurement," Appl. Opt. 51, 8579-8586 (2012)

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