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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 51, Iss. 5 — Feb. 10, 2012
  • pp: 525–530

Study of a novel and simple method of generating binary mask for microprism fabrication

Arash Sabatyan and Alireza Hemmat  »View Author Affiliations


Applied Optics, Vol. 51, Issue 5, pp. 525-530 (2012)
http://dx.doi.org/10.1364/AO.51.000525


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Abstract

A new and simple method for generating binary masks for fabrication of gray scale micro-optical elements is proposed and examined. In this technique the main idea is superimposing two or more gratings with slightly different pitches that depend on the considered gray tone level. This causes generation of a chirped binary mask in which the openings widths are changed from a maximum to minimum through considered steps. Furthermore, to show its capability, it was applied to fabricate some microprisms. In addition, influence of proximity gap, and designation parameters on the surface quality were studied. It is shown that surface deterioration is effectively modified by optimizing the designation parameters. In comparison to other techniques, one of the advantages of this method is to have an assortment of pulse modulated masks that are able to create a variety of gray tone levels. Other advantages are ease in designation and implementation, and the fact that surface roughness could be smoothed effectively by aptly optimized parameters. Theoretical approach, simulation works, and experimental results are presented.

© 2012 Optical Society of America

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: August 8, 2011
Revised Manuscript: October 15, 2011
Manuscript Accepted: October 17, 2011
Published: February 2, 2012

Citation
Arash Sabatyan and Alireza Hemmat, "Study of a novel and simple method of generating binary mask for microprism fabrication," Appl. Opt. 51, 525-530 (2012)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-51-5-525


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References

  1. K. Reimer, U. Hofmann, M. Jürss, W. Pilz, H. J. Quenzer, and B. Wagner, “Fabrication of microrelief surfaces using a one step lithography process,” Proc. SPIE 3226, 2–10 (1997). [CrossRef]
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  6. M. Christophersen and B. F. Phlips, “Gray-tone lithography using an optical diffuser and a contact aligner,” Appl. Phys. Lett. 92, 194102 (2008). [CrossRef]

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