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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 1 — Jan. 1, 2013
  • pp: 20–29

Fourier fringe analysis and its application to metrology of extreme physical phenomena: a review [Invited]

Mitsuo Takeda  »View Author Affiliations

Applied Optics, Vol. 52, Issue 1, pp. 20-29 (2013)

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The paper reviews a technique for fringe analysis referred to as Fourier fringe analysis (FFA) or the Fourier transform method, with a particular focus on its application to metrology of extreme physical phenomena. Examples include the measurement of extremely small magnetic fields with subfluxon sensitivity by electron wave interferometry, subnanometer wavefront evaluation of projection optics for extreme UV lithography, the detection of sub-Ångstrom distortion of a crystal lattice, and the measurement of ultrashort optical pulses in the femotsecond to attosecond range, which show how the advantages of FFA are exploited in these cutting edge applications.

© 2012 Optical Society of America

OCIS Codes
(100.0100) Image processing : Image processing
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.2650) Instrumentation, measurement, and metrology : Fringe analysis
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure

Original Manuscript: August 27, 2012
Manuscript Accepted: September 14, 2012
Published: December 21, 2012

Virtual Issues
(2013) Advances in Optics and Photonics

Mitsuo Takeda, "Fourier fringe analysis and its application to metrology of extreme physical phenomena: a review [Invited]," Appl. Opt. 52, 20-29 (2013)

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