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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 12 — Apr. 20, 2013
  • pp: 2761–2772

System design process for refractive simultaneous short and long wave infrared imaging

Eric Herman, Amber Czajkowski, Daniel Stroschine, and Scott Sparrold  »View Author Affiliations

Applied Optics, Vol. 52, Issue 12, pp. 2761-2772 (2013)

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The future of optical design is multispectral imaging. Advancements in detector technology have led to the challenge of imaging over both short wave infrared and long wave infrared spectrums. This paper discusses the technical hurdles associated with designing a refractor to image over both of these spectrums, such as minimizing chromatic focal shift while maximizing contrast. The design process is outlined on an eight element F/1, 23° full field of view solution. Optomechanical design forms are evaluated by analyzing possible stresses and tolerance errors. Antireflection coating designs are discussed to complete the full system. This entire design process is highlighted as a feasibility study for the future of multispectral imaging devices.

© 2013 Optical Society of America

OCIS Codes
(110.3080) Imaging systems : Infrared imaging
(220.3620) Optical design and fabrication : Lens system design
(220.4880) Optical design and fabrication : Optomechanics
(310.1210) Thin films : Antireflection coatings

ToC Category:
Imaging Systems

Original Manuscript: January 3, 2013
Revised Manuscript: March 8, 2013
Manuscript Accepted: March 15, 2013
Published: April 17, 2013

Eric Herman, Amber Czajkowski, Daniel Stroschine, and Scott Sparrold, "System design process for refractive simultaneous short and long wave infrared imaging," Appl. Opt. 52, 2761-2772 (2013)

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