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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 22 — Aug. 1, 2013
  • pp: 5398–5401

Wavefront aberration compensation of projection lens using clocking lens elements

ChunLai Liu, Wei Huang, Zhenguang Shi, and Weicai Xu  »View Author Affiliations


Applied Optics, Vol. 52, Issue 22, pp. 5398-5401 (2013)
http://dx.doi.org/10.1364/AO.52.005398


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Abstract

For extremely high-performance lithographic lenses, the edge level accuracy of the manufacturing process and multicompensation strategies must be applied. Element clocking can be effectively used to compensate for the low-order figure errors of the elements. Considering that commercial optical software is usually incapable of obtaining good convergence for clocking optimization, this paper proposes a mathematical model of a lithographic lens containing the errors of a surface figure, after which a clocking optimization algorithm is programmed. A clocking optimization instance proving that the clocking optimization algorithm is capable of finding the optimized angle of elements and that clocking is an effective compensation strategy. The calculated accuracy of the proposed mathematic model was found to be acceptable for clocking optimization.

© 2013 Optical Society of America

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.1000) Optical design and fabrication : Aberration compensation
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: May 6, 2013
Manuscript Accepted: June 30, 2013
Published: July 24, 2013

Citation
ChunLai Liu, Wei Huang, Zhenguang Shi, and Weicai Xu, "Wavefront aberration compensation of projection lens using clocking lens elements," Appl. Opt. 52, 5398-5401 (2013)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-52-22-5398


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References

  1. W. Xu, “Optical ddesign and imaging performance compensation for the lithographic lens,” Ph.D. dissertation (Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Science, 2011) pp. 29–31.
  2. T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, “Improving lens performance through the most recent lens manufacturing process,” Proc. SPIE 5040, 801–810 (2003). [CrossRef]
  3. T. Yoshihara, R. Koizumi, K. Takahashi, S. Suda, and A. Suzuki, “Realization of very small aberration projection lenses,” Proc. SPIE 4000, 559–566 (2000). [CrossRef]
  4. E. Miao, J. Zhang, Y. Gu, Y. Kang, and W. Liu, “Measurement error analysis of high precision Fizeau interferometer for lithography projection objective,” Chinese J. Lasers 37, 2029–2034 (2010). [CrossRef]
  5. P. Wang, W. Tian, R. Wang, L. Wang, Y. Sui, and H. Yang, “Rotating chuck test for removing chuck error of optical surface,” Acta Opt. Sin. 31, 136–143 (2011).
  6. X. Wei and X. Yu, “An optical wavefront sensing and reconstruction method based on Zernike polynominals,” Acta Opt. Sin. 14, 718–723 (1994).
  7. Code V, ORA corporation, http://www.opticalres.com/ .

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