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Applied Optics

Applied Optics


  • Editor: Joseph N. Mait
  • Vol. 52, Iss. 24 — Aug. 20, 2013
  • pp: 5949–5956

Iridium-coated micropore x-ray optics using dry etching of a silicon wafer and atomic layer deposition

Tomohiro Ogawa, Yuichiro Ezoe, Teppei Moriyama, Ikuyuki Mitsuishi, Takuya Kakiuchi, Takaya Ohashi, Kazuhisa Mitsuda, and Matti Putkonen  »View Author Affiliations

Applied Optics, Vol. 52, Issue 24, pp. 5949-5956 (2013)

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To enhance x-ray reflectivity of silicon micropore optics using dry etching of silicon (111) wafers, iridium coating is tested by use of atomic layer deposition. An iridium layer is successfully formed on sidewalls of tiny micropores with a pore width of 20 μm and depth of 300 μm. The film thickness is 20nm. An enhanced x-ray reflectivity compared to that of silicon is confirmed at Ti Kα 4.51 keV, for what we believe to be the first time, with this type of optics. Some discrepancies from a theoretical reflectivity curve of iridium-coated silicon are noticed at small incident angles <1.3°. When a geometrical shadowing effect due to occultation by a ridge existing on the sidewalls is taken into account, the observed reflectivity becomes well represented by the modified theoretical curve. An estimated surface micro roughness of 1nm rms is consistent with atomic force microscope measurements of the sidewalls.

© 2013 Optical Society of America

OCIS Codes
(340.0340) X-ray optics : X-ray optics
(340.7470) X-ray optics : X-ray mirrors
(350.1260) Other areas of optics : Astronomical optics

ToC Category:
X-ray Optics

Original Manuscript: March 20, 2013
Revised Manuscript: July 18, 2013
Manuscript Accepted: July 18, 2013
Published: August 14, 2013

Virtual Issues
Vol. 8, Iss. 9 Virtual Journal for Biomedical Optics

Tomohiro Ogawa, Yuichiro Ezoe, Teppei Moriyama, Ikuyuki Mitsuishi, Takuya Kakiuchi, Takaya Ohashi, Kazuhisa Mitsuda, and Matti Putkonen, "Iridium-coated micropore x-ray optics using dry etching of a silicon wafer and atomic layer deposition," Appl. Opt. 52, 5949-5956 (2013)

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